Large-sized Mono-Si Rod

Detail

It is mainly used in etching, LPCVD, and heat treatment processes.

Mono-Si Rod / 3-6 inch

Detail

The Mono-Si rods（3-6 inch）are primarily applied in semiconductor discrete devices and integrated circuits, with end-use scenarios of span-ning communications, new energy, automotive electronics, consumer electronics, industrial electronics, home appliances, and security equipment.

Poly-Si Ingot /Poly-Si Cylinder

Detail

High purity polycrystalline silicon is produced by directional solidiffcation method are mainly used as silicon parts in semiconductor etching chambers through light/heavy doping technology. The product size supporrs customized design.

Silicon Plate / Silicon Ring

Detail

The silicon plate serves as the base of the gas showerhead, uniformly injecting etching gas through micro-holes to ensure uniform distribution of reactants. The silicon ring is placed at the wafer edge. By applying voltage or ground-ing, it helps to uniformly distribute the plasma electric field and suppress edge effects.

Silicon Target

Detail

Silicon targets are extensively employed in coating applications, primarily forming silicon-based thin films viamagnetron sputtering processes on the surface of substrates. The key applications include semiconductor device coating, flat panel display coatings (LCDs, OLEDs, etc.),panel coating and optical glass coating.

Silicon Powder Target

Detail

Silicon targets (powdery) excel in thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor depo-sition (CVD), enabling the preparation of high-quality thin films. The purity and parricle size of the product can be customized according to customer requirements.